ISO 21068-1-2008 含有碳化硅原材料和耐火制品的化学分析.第1部分:一般信息和试样制备

标准号：ISO 21068-1-2008
中文标准名称：含有碳化硅原材料和耐火制品的化学分析.第1部分:一般信息和试样制备
英文标准名称：Chemical analysis of silicon-carbide-containing raw materials and refractory products - Part 1: General information and sample preparation
标准类型：Q40
发布日期：1999/12/31 12:00:00
实施日期：1999/12/31 12:00:00
中国标准分类号：Q40
国际标准分类号：81.080
引用标准：ISO 31-0;ISO 5022;ISO 8656-1;ISO 12677-2003;EN 12698-2;ISO 21068-2-2008
适用范围：This part of ISO 21068 gives definitions and specifies techniques for the preparation of samples for thechemical analysis of silicon-carbidercontaining raw materials and refractory products including:a) graphite bdck containing silicon carbide;b) silicon carbide brick (includes the bricks containing silicon nitride);c) refractories containing carbon and/or silicon carbide mixed with clay;d) refractades containing carbon and/or silicon carbide mixed with silica (and fused silica);e) refractories containing carbon and/or silicon carbide mixed with high alumina material;f) refractories containing carbon and/or silicon carbide mixed with magnesia (and dolomite);g) refractories containing carbon and/or silicon carbide mixed with chrome mineral or magnesia chrome materials;h) refractories containing carbon and/or silicon carbide except those described in a) to g) above.The items of chemical analysis described in ISO 21068, Parts 1 to 3 are as follows: 1) loss on drying (LOD); 2) loss on ignition (LOI); 3) totalcarbon, Ctotal; 4) free carbon, Ceee; 5) silicon carbide, SiC; 6) free silicon (Si); 7) free aluminium (Al); 8) free magnesium (Mg); 9) freeiron (Fe); 10) silicon(IV) oxide (SiO2);11) aluminium oxide (AI203);12) iron(Ill) oxide (total iron oxide calculated as Fe203);13) titanium(IV) oxide (TiO2);14) calcium oxide (CaO);15) magnesium oxide (MgO);16) sodium oxide (Na20);17) potassium oxide (K20);18) chromium(Ig) oxide (0r203);19) zirconium oxide (ZrO2);20) boron oxide (total boron calculated as B203);21) nitrogen;22) oxygen;23) nitrides (undifferentiated: Si3N4, AIN, BN, sialon, oxy-nitrides, etc.).