BS ISO 15573-1998 能量在80KeV和300KeV之间的辐射处理用电子束设备剂量测定操作规程

标准号：BS ISO 15573-1998
中文标准名称：能量在80KeV和300KeV之间的辐射处理用电子束设备剂量测定操作规程
英文标准名称：Practice for dosimetry in an electron-beam facility for radiation processing at energies between 80 keV and 300 keV
标准类型：F81
发布日期：1999/8/15 12:00:00
实施日期：1999/8/15 12:00:00
中国标准分类号：F81
国际标准分类号：17.240
适用范围：1 This practice covers dosimetric procedures to be followed to determine the performance of low energy (300 keV or lest) single-gap electron beam radiation processing facilities. Other practices and procedures related to facility characterization, product qualification, and routine pro-cessing are also discussed. 2 The electron energy range covered in this practice is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma source accelerators. 3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.