DIN 50451-2-2003 半导体工艺材料测试.液体中痕量元素测定.第2部分:用等离子感应发射分光光度测定法测定氢氟酸中钴(Co)、铬(Cr)、铜(Ca)、铁(Fe)和镍(Ni)的含量

标准号：DIN 50451-2-2003
中文标准名称：半导体工艺材料测试.液体中痕量元素测定.第2部分:用等离子感应发射分光光度测定法测定氢氟酸中钴(Co)、铬(Cr)、铜(Ca)、铁(Fe)和镍(Ni)的含量
英文标准名称：Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectros
标准类型：H82
发布日期：1999/12/31 12:00:00
实施日期：1999/12/31 12:00:00
中国标准分类号：H82
适用范围：The document specifies a method for testing hydrofluoric acid for the metal traces of cobalt (Co), chromium (Cr), copper (Cu), iron (Fe), and nickel (Ni) relevant to semiconductor technology. Emission spectroscopy with plasma excitation (for example, inductively coupled plasma (ICP) or direct current plasma (DCP)) is used for the determination. The range of application covers trace element mass fractions from 1 ng/g to 1000 ng/g.#,,#