ISO 16531-2013 表面化学分析.深度剖析.原子发射光谱(AES)和光电子能谱(XPS)中深度剖析用电流或电流密度的离子束校正和相关测量方法

标准号：ISO 16531-2013
中文标准名称：表面化学分析.深度剖析.原子发射光谱(AES)和光电子能谱(XPS)中深度剖析用电流或电流密度的离子束校正和相关测量方法
英文标准名称：Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
标准类型：G04
发布日期：2013/6/1 12:00:00
实施日期：1999/12/31 12:00:00
中国标准分类号：G04
国际标准分类号：71.040.40
引用标准：ISO 18115-1
适用范围：This International Standard specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.