ISO 17331-2004 表面化学分析.从硅片工作基准材料表面采集元素的化学方法及其全反射X射线荧光光谱法的测定

标准号：ISO 17331-2004
中文标准名称：表面化学分析.从硅片工作基准材料表面采集元素的化学方法及其全反射X射线荧光光谱法的测定
英文标准名称：Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
标准类型：G04
发布日期：1999/12/31 12:00:00
实施日期：1999/12/31 12:00:00
中国标准分类号：G04
国际标准分类号：71.040.50
适用范围：This International Standard specifies chemical methods for the collection of iron and/or nickel from the surfaceof silicon-wafer working reference materials by the vapour-phase decomposition method or the direct aciddroplet decomposition method.This International Standard applies to iron and/or nickel atomic surface densities from 6 × 109 atoms/cm2 to5 × 1011 atoms/cm2.